Achim von Keudell
Journal of Physics D: Applied Physics
Researchers from Germany are optimizing a thin film deposition technique that uses Plasmas by using high speed imaging.
The technique called HiPIMS requires precise control of the quality of the plasma in the coating chamber. Specifically, the group uses an ICCD with ns gate width to image regions of very pronounced ionization called spokes. They find that by monitoring the pattern of spokes the deposition process can be optimized.